Product novelty 06. May 2024
300mm optical Wafer with Metasurfaces
Researchers at Fraunhofer IOF have succeeded for the first time in producing a metasurface with a diameter of almost 30 centimeters using electron beam lithography. The new manufacturing technology can help build optical systems significantly thinner in the future. Such large metasurfaces are particularly advantageous for compact optics in which large deflection angles are required in a small space.
Fraunhofer IOF
Contact
Mr. Stefan Riehemann